The Si(OH)4 concentration has been varied below the euphotic zone (120m) in order to test different Si(OH)4 supplies. There are four experiment:

"Standard" as the similar results presented in the section "The Results";

"High Si(OH)4 Input" means the Si(OH)4 concentration was increased by 50% from the "Standard" case and all other parameters were unchanged;

"Low Si(OH)4 Input" means the Si(OH)4 concentration was decreased by 50% from the "Standard" case and all other parameters were unchanged.

"Low Si(OH)4 Input & High NH4 Inhibation" means the Si(OH)4 concentration was decreased by 50% from the "Standard" case and the NH4 inhibation parameter increased to 10 from the "Standard" of 5.59.

Vertical Profile Comparison

Surface Concentration Comparison

Budget for 0-120m

Budget for "Low Si(OH)4 Input"

Budget for "Standard"

Budget for "High Si(OH)4 Input"

Budget for "Low Si(OH)4 Input &High NH4 Inhibation"

Budget for 0-45m

Budget for "Low Si(OH)4 Input"

Budget for "Standard"

Budget for "High Si(OH)4 Input"

Budget for "Low Si(OH)4 Input &High NH4 Inhibation"

The Vertical Concentration Data Files

"Low Si(OH)4 Input" Vertical Concentration

"Standard" Vertical Concentration

"High SI(OH)4 Input" Vertical Concentration

"Low Si(OH)4 Input & High NH4 Inhibation" Vertical Concentration

The Vertical Rates (daily averaged) Data Files

"Low Si(OH)4 Input" Vertical Rates

"Standard" Vertical Rates

"High SI(OH)4 Input" Vertical Rates

"Low Si(OH)4 Input & High NH4 Inhibation" Vertical Rates